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[IEEE 2010 IEEE 3rd International Nanoelectronics Conference (INEC) - Hong Kong, China (2010.01.3-2010.01.8)] 2010 3rd International Nanoelectronics Conference (INEC) - Memory characteristics of multilayer structures with lanthanum-aluminate charge trap by fowler-nordheim tunneling

[IEEE 2010 IEEE 3rd International Nanoelectronics Conference (INEC) - Hong Kong, China (2010.01.3-2010.01.8)] 2010 3rd International Nanoelectronics Conference (INEC) - Memory characteristics of multilayer structures with lanthanum-aluminate charge trap by fowler-nordheim tunneling

Seung-Yong Cha, ; Hyo-June Kim, ; Doo-Jin Choi,
  • 作者Seung-Yong Cha, ; Hyo-June Kim, ; Doo-Jin Choi,
  • 文件大小173.50KB
  • 发表时间2010
  • DOI10.1109/inec.2010.5424946
  • 页码1210-1211
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