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Local Density Diffusivity (LDD-) Model for Boron Out-Diffusion of <i>In Situ</i> Boron-Doped Si<sub>0.75</sub>Ge<sub>0.25</sub> Epitaxial Films Post Advanced Rapid Thermal Anneals with Carbon Co-Implant

Local Density Diffusivity (LDD-) Model for Boron Out-Diffusion of In Situ Boron-Doped Si_0.75Ge_0.25 Epitaxial Films Post Advanced Rapid Thermal Anneals with Carbon Co-Implant

Wirbeleit, Frank

期刊名称Defect and Diffusion Forum
作者Wirbeleit, Frank
卷第307卷
电子ISSN1662-9507
文件大小2156.27KB
发表时间2010-12
DOI10.4028/www.scientific.net/DDF.307.63
页码63-73

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