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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - <title>New self-assembly strategies for next generation lithography</title>

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - New self-assembly strategies for next generation lithography

Schwartz, Evan L.; Bosworth, Joan K.; Paik, Marvin Y.; Ober, Christopher K.; Allen, Robert D.
  • 作者Schwartz, Evan L.; Bosworth, Joan K.; Paik, Marvin Y.; Ober, Christopher K.; Allen, Robert D.
  • 卷第7639卷
  • 印刷ISSN0277-786X
  • 文件大小1005.57KB
  • 发表时间2010
  • DOI10.1117/12.848409
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