High-Resolution Secondary Electron Imaging of a FIB Prepared Si Sample with an Aberration Corrected Electron Microscope
- 期刊名称Microscopy and Microanalysis
- 作者Konno, M; Suzuki, Y; Inada, H; Nakamura, K; Kimoto, K; Zhu, Y
- 卷第16卷
- 印刷ISSN1431-9276
- 电子ISSN1435-8115
- 文件大小1170.04KB
- 发表时间2010-7
- DOI10.1017/s1431927610054875
- 页码128-129
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