Applications of Compact Laser-Driven EUV/XUV Plasma Sources
- 期刊名称X-Ray Optics and Instrumentation
- 作者Bayer, Armin; Barkusky, Frank; Großmann, Peter; Mann, Klaus
- 卷第2010卷
- 印刷ISSN1687-7632
- 电子ISSN1687-7640
- 文件大小3414.12KB
- 发表时间2010
- DOI10.1155/2010/687496
- 页码1-9
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