Modeling of the radicalary state in the H2O2/UV oxidation system to predict the degradation kinetics of phenolic mixture solutions

• 作者Ana De Luis; José Ignacio Lombraña; Amaia Menéndez
• 卷第30卷
• 期第2期
• 印刷ISSN1944-7442
• 电子ISSN1944-7450
• 文件大小312.06KB
• 发表时间2011
• DOI10.1002/ep.10468
• 页码196-207