Numerical and experimental study of the thermal stress of silicon induced by a millisecond laser
- 期刊名称ao/50/21/ao-50-21-3725.pdf
- 作者Wang, Xi; Qin, Yuan; Wang, Bin; Zhang, Liang; Shen, Zhonghua; Lu, Jian; Ni, Xiaowu
- 卷第50卷
- 期第21期
- 印刷ISSN0003-6935
- 电子ISSN1539-4522
- 文件大小718.87KB
- 发表时间2011
- DOI10.1364/AO.50.003725
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