Microscopic observation of lateral diffusion at Si–SiO2 interface by photoelectron emission microscopy using synchrotron radiation
- 作者N. Hirao; Y. Baba; T. Sekiguchi; I. Shimoyama; M. Honda
- 卷第258卷
- 期第3期
- 印刷ISSN0169-4332
- 文件大小406.42KB
- 发表时间2011
- DOI10.1016/j.apsusc.2011.04.047
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