[IEEE 2011 12th International Conference on Ultimate Integration on Silicon (ULIS) - Cork, Ireland (2011.03.14-2011.03.16)] Ulis 2011 Ultimate Integration on Silicon - Two-dimensional carrier mapping at the nanometer-scale on 32nm node targeted p-MOSFETs using high vacuum scanning spreading resistance microscopy
Eyben, Pierre; Clarysse, Trudo; Mody, Jay; Nazir, Aftab; Schulze, Andreas; Hantschel, Thomas; Vandervorst, Wilfried
- 作者Eyben, Pierre; Clarysse, Trudo; Mody, Jay; Nazir, Aftab; Schulze, Andreas; Hantschel, Thomas; Vandervorst, Wilfried
- 文件大小154.52KB
- 发表时间2011
- DOI10.1109/ulis.2011.5758008
- 页码1-4