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AIP Conference Proceedings [AIP APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY: Twenty-First International Conference - Fort Worth, Texas, (USA) (8–13 August 2010)] - SHI Effects On Ge+SiO[sub 2] Composite Films Prepared By RF Sputtering

AIP Conference Proceedings [AIP APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY: Twenty-First International Conference - Fort Worth, Texas, (USA) (8–13 August 2010)] - SHI Effects On Ge+SiO[sub 2] Composite Films Prepared By RF Sputtering

Rao, N. Srinivasa; Pathak, A. P.; Sathish, N.; Devaraju, G.; Saikiran, V.; McDaniel, Floyd D.; Doyle, Barney L.
  • 作者Rao, N. Srinivasa; Pathak, A. P.; Sathish, N.; Devaraju, G.; Saikiran, V.; McDaniel, Floyd D.; Doyle, Barney L.
  • DOI210.0000/www.researchgate.net/216224613
  • 印刷ISSN0094-243X
  • 文件大小837.18KB
  • 发表时间2011
  • DOI10.1063/1.3586116
  • 页码341-344
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