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Gallic Acid as a Complexing Agent for Copper Chemical Mechanical Polishing Slurries at Neutral pH

Gallic Acid as a Complexing Agent for Copper Chemical Mechanical Polishing Slurries at Neutral pH

Kim, Yung Jun; Kang, Min Cheol; Kwon, Oh Joong; Kim, Jae Jeong
  • 期刊名称Japanese Journal of Applied Physics
  • 作者Kim, Yung Jun; Kang, Min Cheol; Kwon, Oh Joong; Kim, Jae Jeong
  • 卷第50卷
  • 期第5期
  • 印刷ISSN0021-4922
  • 电子ISSN1347-4065
  • 文件大小565.23KB
  • 发表时间2011-5-20
  • DOI10.1143/JJAP.50.056501
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