Gallic Acid as a Complexing Agent for Copper Chemical Mechanical Polishing Slurries at Neutral pH
Kim, Yung Jun; Kang, Min Cheol; Kwon, Oh Joong; Kim, Jae Jeong
- 期刊名称Japanese Journal of Applied Physics
- 作者Kim, Yung Jun; Kang, Min Cheol; Kwon, Oh Joong; Kim, Jae Jeong
- 卷第50卷
- 期第5期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小565.23KB
- 发表时间2011-5-20
- DOI10.1143/JJAP.50.056501