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Atomic step patterning in nanoimprint lithography: Molecular dynamics study

Atomic step patterning in nanoimprint lithography: Molecular dynamics study

K. Tada; M. Yasuda; G. Tan; Y. Miyake; H. Kawata; M. Yoshimoto; Y. Hirai

作者K. Tada; M. Yasuda; G. Tan; Y. Miyake; H. Kawata; M. Yoshimoto; Y. Hirai
文件大小2503.65KB
发表时间2011
DOI10.1116/1.3659712

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