Photo-removal of sulfamethoxazole (SMX) by photolytic and photocatalytic processes in a batch reactor under UV-C radiation (λmax = 254 nm)

• 作者Deniz Nasuhoglu; Viviane Yargeau; Dimitrios Berk
• 卷第186卷
• 期第1期
• 印刷ISSN0304-3894
• 文件大小934.23KB
• 发表时间2011
• DOI10.1016/j.jhazmat.2010.10.080
• 页码67-75