Stable deposition of silicon oxynitride thin films with intermediate refractive indices by reactive sputtering
- 作者Yuki Nakanishi; Kazuhiro Kato; Hideo Omoto; Takao Tomioka; Atsushi Takamatsu
- 卷第520卷
- 期第10期
- 印刷ISSN0040-6090
- 文件大小433.70KB
- 发表时间2012
- DOI10.1016/j.tsf.2011.10.052
- 页码3862-3864
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