Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

• 作者Xiufeng Tang; Fa Luo; Fang Ou; Wancheng Zhou; Dongmei Zhu; Zhibin Huang
• 卷第259卷
• 印刷ISSN0169-4332
• 文件大小1398.29KB
• 发表时间2012
• DOI10.1016/j.apsusc.2012.07.064