Random Poly(methyl methacrylate-co-styrene) Brushes by ATRP to Create Neutral Surfaces for Block Copolymer Self-Assembly

• 作者Hui Liu; Colm T. O'Mahony; Fabrice Audouin; Claudia Ventura; Michael Morris; Andreas Heise
• 卷第213卷
• 期第1期
• 印刷ISSN1022-1352
• 电子ISSN1521-3935
• 文件大小795.61KB
• 发表时间2012
• DOI10.1002/macp.201100531
• 页码108-115