Planarization process of single crystalline silicon asperity under abrasive rolling effect studied by molecular dynamics simulation
- 期刊名称Applied Physics A
- 作者Si, Lina; Guo, Dan; Luo, Jianbin; Xie, Guoxin
- 卷第109卷
- 期第1期
- 印刷ISSN0947-8396
- 电子ISSN1432-0630
- 文件大小1531.55KB
- 发表时间2012-10
- DOI10.1007/s00339-012-7026-z
- 页码119-126
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