SPIE Proceedings [SPIE 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012) - Xiamen, China (Thursday 26 April 2012)] 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies - Illuminator design for small field ArF lithography system
- 作者Wei, Lidong; Li, Yanqiu; Liu, Ke; Liu, Xiaolin; Yang, Li; Ruch, Eric; Li, Shengyi
- 卷第8416卷
- 印刷ISSN0277-786X
- 文件大小513.90KB
- 发表时间2012
- DOI10.1117/12.978289
Electro-rheologyBlock, H; Kelly, J P · Journal of Physics D: Applied Physics · 1988
Semiconductor nanowiresLu, Wei; Lieber, Charles M · Journal of Physics D: Applied Physics · 2006
Nanoassembled model catalystsHeiz, Ueli; Schneider, Wolf-Dieter · Journal of Physics D: Applied Physics · 2000
Mechanisms for exchange biasStamps, R L · Journal of Physics D: Applied Physics · 2000
Thermal plasma waste treatmentHeberlein, Joachim; Murphy, Anthony B · Journal of Physics D: Applied Physics · 2008
Surface enhanced fluorescenceFort, Emmanuel; Grésillon, Samuel · Journal of Physics D: Applied Physics · 2008
Nanocomposite dielectrics—properties and implicationsNelson, J K; Hu, Y · Journal of Physics D: Applied Physics · 2005
Memristor-based neural networksThomas, Andy · Journal of Physics D: Applied Physics · 2013