Enhancement of Ferroelectric Polarization Stability by Interface Engineering
H. Lu; X. Liu; J. D. Burton; C.-W. Bark; Y. Wang; Y. Zhang; D. J. Kim; A. Stamm; P. Lukashev; D. A. Felker; C. M. Folkman; P. Gao; M. S. Rzchowski; X. Q. Pan; C.-B. Eom; E. Y. Tsymbal; A. Gruverman
- 作者H. Lu; X. Liu; J. D. Burton; C.-W. Bark; Y. Wang; Y. Zhang; D. J. Kim; A. Stamm; P. Lukashev; D. A. Felker; C. M. Folkman; P. Gao; M. S. Rzchowski; X. Q. Pan; C.-B. Eom; E. Y. Tsymbal; A. Gruverman
- 卷第24卷
- 期第9期
- 印刷ISSN0935-9648
- 电子ISSN1521-4095
- 文件大小3215.23KB
- 发表时间2012
- DOI10.1002/adma.201104398
- 页码1209-1216