:Mg crystals
- 期刊名称Physical Review B
- 作者Xin, Feifei; Zhai, Zhaohui; Wang, Xiaojie; Kong, Yongfa; Xu, Jingjun; Zhang, Guoquan
- 卷第86卷
- 期第16期
- 印刷ISSN1098-0121
- 电子ISSN1550-235X
- 文件大小774.81KB
- 发表时间2012-10-24
- DOI10.1103/PhysRevB.86.165132
A comparison of 20 kV and 50 kV e-beam lithography for MOS circuit fabricationS. Vaidya; D.K. Atwood; E.H. Kung; K.K. Ng · 1989
A PDF method for multidimensional modeling of HCCI engine combustion: effects of turbulence/chemistry interactions on ignition timing and emissionsY.Z. Zhang; E.H. Kung; D.C. Haworth · 2005
Proximity effect correction for nanolithographyRau, Richard · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1996
Lithography with 157 nm lasersBloomstein, T. M. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1997
X-ray lithographyHeuberger, A. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1988
Resolution limits of optical lithographyOkazaki, Shinji · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1991
Review of scanning force microscopySarid, Dror · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1991
Diamond nanorodsShenderova, O. A.; Padgett, C. W.; Hu, Z.; Brenner, D. W. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 2005
Dielectric/semiconductor interfacesWieder, H. H. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1993
Two-dimensional carrier profilingVandervorst, W. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1992