Computer simulations of crystallization kinetics in amorphous silicon under pressure
- 期刊名称Journal of Applied Physics
- 作者Shanavas, K. V.; Pandey, K. K.; Garg, Nandini; Sharma, Surinder M.
- 卷第111卷
- 期第6期
- 印刷ISSN0021-8979
- 文件大小1558.74KB
- 发表时间2012
- DOI10.1063/1.3694735
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