Dependence of Dissolution Point on Pattern Size of Chemically Amplified Extreme Ultraviolet Resist
- 期刊名称Japanese Journal of Applied Physics
- 作者Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro
- 卷第51卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小468.24KB
- 发表时间2012-9-10
- DOI10.1143/JJAP.51.108002
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