Residual-type mask defect printability for extreme ultraviolet lithography

• 期刊名称Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• 作者Amano, Tsuyoshi; Iida, Susumu; Hirano, Ryoichi; Terasawa, Tsuneo; Watanabe, Hidehiro; Inazuki, Yuichi
• 卷第30卷
• 期第6期
• 印刷ISSN2166-2746
• 文件大小2151.34KB
• 发表时间2012
• DOI10.1116/1.4756934