Pattern-integrated interference lithography: single-exposure fabrication of photonic-crystal structures
- 期刊名称Applied Optics
- 作者Burrow, Guy M.; Leibovici, Matthieu C. R.; Gaylord, Thomas K.
- 卷第51卷
- 期第18期
- 印刷ISSN0003-6935
- 电子ISSN1539-4522
- 文件大小2067.39KB
- 发表时间2012-06-20
- DOI10.1364/ao.51.004028
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