SPIE Proceedings [SPIE SPIE Astronomical Telescopes + Instrumentation - Amsterdam, Netherlands (Sunday 1 July 2012)] Software and Cyberinfrastructure for Astronomy II - SPIRou @ CFHT: design of the instrument control system
- 作者Barrick, Gregory A.; Vermeulen, Tom; Baratchart, Sébastien; Reshetov, Vladimir A.; Wang, Shiang-Yu; Dolon, François; Hernandez, Olivier; Pepe, Francesco; Bouchy, François; Dunn, Jennifer; Dupieux, Michel; Gallou, Gérard; Larrieu, Marie; Fonteneau, Alexandre; Moreau, François; Wildi, François; Parès, Laurent P.; Thomas, James N.; Yan, Chi-Hung; Doyon, René; Donati, Jean-François; Vallée, Philippe; Artigau, Étienne; Delfosse, Xavier; Rabou, Patrick; Thibault, Simon; Kouach, Driss; Loop, David; Radziwill, Nicole M.; Chiozzi, Gianluca
- 卷第8451卷
- 印刷ISSN0277-786X
- 文件大小737.75KB
- 发表时间2012
- DOI10.1117/12.926392
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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Advanced mask aligner lithography (AMALITH)Voelkel, Reinhard; Vogler, Uwe; Bramati, Arianna; Weichelt, Tina; Stuerzebecher, Lorenz; Zeitner, Uwe D.; Motzek, Kristian; Erdmann, Andreas; Hornung, Michael; Zoberbier, Ralph; Conley, Will · 2012
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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Front Matter: Volume 7636La Fontaine, Bruno M.; SPIE, Proceedings of · 2010