Influence of oxygen flow rate on photocatalytic TiO2films deposited by rf magnetron sputtering
- 作者A. H. Chiou; C. G. Kuo; C. H. Huang; W. F. Wu; C. P. Chou; C. Y. Hsu
- 卷第23卷
- 期第2期
- 印刷ISSN0957-4522
- 电子ISSN1573-482X
- 文件大小542.20KB
- 发表时间2012-02
- DOI10.1007/s10854-011-0445-3
- 页码589-594
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