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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patterns

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patterns

Hartley, John G.; Tong, William M.; Resnick, Douglas J.; Crosland, Nigel; Dowling, Robert C.; Hoyle, Philip C.; McClelland, Andrew; Turnidge, Martin; Smith, James H.
  • 作者Hartley, John G.; Tong, William M.; Resnick, Douglas J.; Crosland, Nigel; Dowling, Robert C.; Hoyle, Philip C.; McClelland, Andrew; Turnidge, Martin; Smith, James H.
  • 卷第8680卷
  • 印刷ISSN0277-786X
  • 文件大小1100.89KB
  • 发表时间2013
  • DOI10.1117/12.2011664
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