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Crystal Growth and Real Structure Effects of the First Weak 3D Stacked Topological Insulator Bi
<sub/>14</sub>
Rh
<sub/>3</sub>
I
<sub/>9</sub>

Crystal Growth and Real Structure Effects of the First Weak 3D Stacked Topological Insulator Bi ₁₄ Rh ₃ I ₉

Rasche, Bertold; Isaeva, Anna; Gerisch, Alexander; Kaiser, Martin; Van den Broek, Wouter; Koch, Christoph T.; Kaiser, Ute; Ruck, Michael

期刊名称Chemistry of Materials
作者Rasche, Bertold; Isaeva, Anna; Gerisch, Alexander; Kaiser, Martin; Van den Broek, Wouter; Koch, Christoph T.; Kaiser, Ute; Ruck, Michael
卷第25卷
期第11期
印刷ISSN0897-4756
电子ISSN1520-5002
文件大小1214.65KB
发表时间2013-06-11
DOI10.1021/cm4010823
页码2359-2364

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