Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma

Huang, Li-Tien; Chang, Ming-Lun; Huang, Jhih-Jie; Lin, Hsin-Chih; Kuo, Chin-Lung; Lee, Min-Hung; Liu, Chee Wee; Chen, Miin-Jang

期刊名称Applied Surface Science
作者Huang, Li-Tien; Chang, Ming-Lun; Huang, Jhih-Jie; Lin, Hsin-Chih; Kuo, Chin-Lung; Lee, Min-Hung; Liu, Chee Wee; Chen, Miin-Jang
卷第266卷
印刷ISSN0169-4332
文件大小826.24KB
发表时间2013-02
DOI10.1016/j.apsusc.2012.11.097
页码89-93

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