Deposition of undoped and H doped WOx (x≤3) films in a hot-wire atomic layer deposition system without the use of tungsten precursors
Kostis, I.; Vasilopoulou, M.; Papadimitropoulos, G.; Stathopoulos, N.; Savaidis, S.; Davazoglou, D.
- 期刊名称Surface and Coatings Technology
- 作者Kostis, I.; Vasilopoulou, M.; Papadimitropoulos, G.; Stathopoulos, N.; Savaidis, S.; Davazoglou, D.
- 卷第230卷
- 印刷ISSN0257-8972
- 文件大小1334.88KB
- 发表时间2013-09
- DOI10.1016/j.surfcoat.2013.06.021
- 页码51-58