SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Resist process applications to improve EUV patterning
- 作者Petrillo, Karen; Naulleau, Patrick P.; Cho, Kyoungyoung; Friz, Alexander; Montgomery, Cecilia; Ashworth, Dominic; Neisser, Mark; Wurm, Stefan; Saito, Takashi; Huli, Lior; Ko, Akiteru; Metz, Andrew
- 卷第8679卷
- 印刷ISSN0277-786X
- 文件大小1286.16KB
- 发表时间2013
- DOI10.1117/12.2011566
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