HfO2-assisted SiO2 reduction in HfO2/SiO2/Si stacks
Li, Xiuyan; Yajima, Takeaki; Nishimura, Tomonori; Nagashio, Kosuke; Toriumi, Akira
- 期刊名称Thin Solid Films
- 作者Li, Xiuyan; Yajima, Takeaki; Nishimura, Tomonori; Nagashio, Kosuke; Toriumi, Akira
- 卷第557卷
- 印刷ISSN0040-6090
- 文件大小924.73KB
- 发表时间2014-04
- DOI10.1016/j.tsf.2013.10.142
- 页码272-275