Nanoindentation responses of Si–Ge multilayers
- 期刊名称International Journal of Materials Research
- 作者Lian, Derming
- 卷第105卷
- 期第2期
- 印刷ISSN1862-5282
- 电子ISSN2195-8556
- 文件大小652.45KB
- 发表时间2014-02-10
- DOI10.3139/146.111001
- 页码139-144
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