[IEEE 2014 14th International Workshop on Junction Technology (IWJT) - Shanghai, China (2014.5.18-2014.5.20)] 2014 International Workshop on Junction Technology (IWJT) - Ion implantation technology in SiC for power device applications
Kimoto, Tsunenobu; Kawahara, Koutaro; Niwa, Hiroki; Kaji, Naoki; Suda, Jun
- 作者Kimoto, Tsunenobu; Kawahara, Koutaro; Niwa, Hiroki; Kaji, Naoki; Suda, Jun
- 文件大小338.15KB
- 发表时间2014
- DOI10.1109/IWJT.2014.6842018
- 页码1-6