Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O

Aarik, Lauri; Alles, Harry; Aidla, Aleks; Kahro, Tauno; Kukli, Kaupo; Niinistö, Jaakko; Mändar, Hugo; Tamm, Aile; Rammula, Raul; Sammelselg, Väino; Aarik, Jaan

期刊名称Thin Solid Films
作者Aarik, Lauri; Alles, Harry; Aidla, Aleks; Kahro, Tauno; Kukli, Kaupo; Niinistö, Jaakko; Mändar, Hugo; Tamm, Aile; Rammula, Raul; Sammelselg, Väino; Aarik, Jaan
卷第565卷
印刷ISSN0040-6090
文件大小1219.29KB
发表时间2014-08
DOI10.1016/j.tsf.2014.06.052
页码37-44

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Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O