Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS
- 期刊名称ACS Applied Materials & Interfaces
- 作者Ding, Tao; Sigle, Daniel O.; Herrmann, Lars O.; Wolverson, Daniel; Baumberg, Jeremy J.
- 卷第6卷
- 期第20期
- 印刷ISSN1944-8244
- 电子ISSN1944-8252
- 文件大小5765.74KB
- 发表时间2014-10-22
- DOI10.1021/am505511v
- 页码17358-17363
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