Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching
- 期刊名称Journal of Physics D: Applied Physics
- 作者Gul, Banat; Tinck, Stefan; De Schepper, Peter; Rehman, Aman-ur-; Bogaerts, Annemie
- 卷第48卷
- 期第2期
- 印刷ISSN0022-3727
- 电子ISSN1361-6463
- 文件大小1206.76KB
- 发表时间2015-01-21
- DOI10.1088/0022-3727/48/2/025202
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