Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime

Zhang, Yu-Ru; Tinck, Stefan; Schepper, Peter De; Wang, You-Nian; Bogaerts, Annemie

期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
作者Zhang, Yu-Ru; Tinck, Stefan; Schepper, Peter De; Wang, You-Nian; Bogaerts, Annemie
卷第33卷
期第2期
印刷ISSN0734-2101
电子ISSN1520-8559
文件大小2093.65KB
发表时间2015-03
DOI10.1116/1.4906819

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