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Thermal Atomic Layer Deposition of Titanium Films Using Titanium Tetrachloride and 2-Methyl-1,4-bis(trimethylsilyl)-2,5-cyclohexadiene or 1,4-Bis(trimethylsilyl)-1,4-dihydropyrazine

Thermal Atomic Layer Deposition of Titanium Films Using Titanium Tetrachloride and 2-Methyl-1,4-bis(trimethylsilyl)-2,5-cyclohexadiene or 1,4-Bis(trimethylsilyl)-1,4-dihydropyrazine

Klesko, Joseph P.; Thrush, Christopher M.; Winter, Charles H.

期刊名称Chemistry of Materials
作者Klesko, Joseph P.; Thrush, Christopher M.; Winter, Charles H.
卷第27卷
期第14期
印刷ISSN0897-4756
电子ISSN1520-5002
文件大小533.86KB
发表时间2015-07-28
DOI10.1021/acs.chemmater.5b01707
页码4918-4921

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