Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography
Bourgin, Yannick; Siefke, Thomas; Käsebier, Thomas; Genevée, Pascal; Szeghalmi, Adriana; Kley, Ernst-Bernhard; Zeitner, Uwe D.
- 期刊名称Optics Express
- 作者Bourgin, Yannick; Siefke, Thomas; Käsebier, Thomas; Genevée, Pascal; Szeghalmi, Adriana; Kley, Ernst-Bernhard; Zeitner, Uwe D.
- 卷第23卷
- 期第13期
- 电子ISSN1094-4087
- 文件大小2886.83KB
- 发表时间2015-06-29
- DOI10.1364/OE.23.016628