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Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography

Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography

Bourgin, Yannick; Siefke, Thomas; Käsebier, Thomas; Genevée, Pascal; Szeghalmi, Adriana; Kley, Ernst-Bernhard; Zeitner, Uwe D.
  • 期刊名称Optics Express
  • 作者Bourgin, Yannick; Siefke, Thomas; Käsebier, Thomas; Genevée, Pascal; Szeghalmi, Adriana; Kley, Ernst-Bernhard; Zeitner, Uwe D.
  • 卷第23卷
  • 期第13期
  • 电子ISSN1094-4087
  • 文件大小2886.83KB
  • 发表时间2015-06-29
  • DOI10.1364/OE.23.016628
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