Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)

Gharachorlou, Amir; Detwiler, Michael D.; Gu, Xiang-Kui; Mayr, Lukas; Klötzer, Bernhard; Greeley, Jeffrey; Reifenberger, Ronald G.; Delgass, W. Nicholas; Ribeiro, Fabio H.; Zemlyanov, Dmitry Y.

期刊名称ACS Applied Materials & Interfaces
作者Gharachorlou, Amir; Detwiler, Michael D.; Gu, Xiang-Kui; Mayr, Lukas; Klötzer, Bernhard; Greeley, Jeffrey; Reifenberger, Ronald G.; Delgass, W. Nicholas; Ribeiro, Fabio H.; Zemlyanov, Dmitry Y.
卷第7卷
期第30期
印刷ISSN1944-8244
电子ISSN1944-8252
文件大小9709.59KB
发表时间2015-08-05
DOI10.1021/acsami.5b03598
页码16428-16439

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Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)