Monolithic, Crystalline MOF Coating: An Excellent Patterning and Photoresist Material
- 期刊名称ChemNanoMat
- 作者Wang, Zhengbang; Liu, Jinxuan; Grosjean, Sylvain; Wagner, Danny; Guo, Wei; Gu, Zhigang; Heinke, Lars; Gliemann, Hartmut; Bräse, Stefan; Wöll, Christof
- 卷第1卷
- 期第5期
- 印刷ISSN2199-692X
- 文件大小1588.27KB
- 发表时间2015-09
- DOI10.1002/cnma.201500031
- 页码338-345
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