SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - EUV mask observations using a coherent EUV scatterometry microscope with a high-harmonic-generation source
Yoshioka, Nobuyuki; Fujino, Takahiro; Tanaka, Yusuke; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo; Kinoshita, Hiroo
- 作者Yoshioka, Nobuyuki; Fujino, Takahiro; Tanaka, Yusuke; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo; Kinoshita, Hiroo
- 卷第9658卷
- 印刷ISSN0277-786X
- 文件大小1112.84KB
- 发表时间2015
- DOI10.1117/12.2194253