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Probing the molecular structures of plasma-damaged and surface-repaired low-k dielectrics

Zhang, Xiaoxian; Myers, John N.; Lin, Qinghuang; Bielefeld, Jeffery D.; Chen, Zhan

期刊名称Phys. Chem. Chem. Phys.
作者Zhang, Xiaoxian; Myers, John N.; Lin, Qinghuang; Bielefeld, Jeffery D.; Chen, Zhan
卷第17卷
期第39期
印刷ISSN1463-9076
电子ISSN1463-9084
文件大小2731.80KB
发表时间2015
DOI10.1039/C5CP03649F
页码26130-26139