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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - Breaking through 1D layout limitations and regaining 2D design freedom Part I: 2D layout decomposition and stitching techniques for hybrid optical and self-aligned multiple patterning

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - Breaking through 1D layout limitations and regaining 2D design freedom Part I: 2D layout decomposition and stitching techniques for hybrid optical and self-aligned multiple patterning

Sturtevant, John L.; Capodieci, Luigi; Liu, Hongyi; Zhou, Jun; Chen, Yijian
  • 作者Sturtevant, John L.; Capodieci, Luigi; Liu, Hongyi; Zhou, Jun; Chen, Yijian
  • 卷第9427卷
  • 印刷ISSN0277-786X
  • 文件大小676.12KB
  • 发表时间2015
  • DOI10.1117/12.2085738
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