SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - Breaking through 1D layout limitations and regaining 2D design freedom part II: stitching yield modeling and optimization
Sturtevant, John L.; Capodieci, Luigi; Zhou, Jun; Liu, Hongyi; Han, Ting; Chen, Yijian
- 作者Sturtevant, John L.; Capodieci, Luigi; Zhou, Jun; Liu, Hongyi; Han, Ting; Chen, Yijian
- 卷第9427卷
- 印刷ISSN0277-786X
- 文件大小2326.49KB
- 发表时间2015
- DOI10.1117/12.2085898