Growth and characterization of (1 −
x
)BiFeO
3
–
x
(Bi
0.5
,K
0.5
)TiO
3
thin films
Choi, Jin Hong; Yoshimura, Takeshi; Fujimura, Norifumi
- 期刊名称Japanese Journal of Applied Physics
- 作者Choi, Jin Hong; Yoshimura, Takeshi; Fujimura, Norifumi
- 卷第54卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小907.62KB
- 发表时间2015-10-01
- DOI10.7567/JJAP.54.10NA14