SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography
- 作者Lai, Kafai; Erdmann, Andreas; Bourgin, Yannick; Siefke, Thomas; Käsebier, Thomas; Kley, Ernst-Bernhard; Zeitner, Uwe D.
- 卷第9426卷
- 印刷ISSN0277-786X
- 文件大小1131.97KB
- 发表时间2015
- DOI10.1117/12.2085777
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