[IEEE 2015 International Semiconductor Conference (CAS) - Sinaia, Romania (2015.10.12-2015.10.14)] 2015 International Semiconductor Conference (CAS) - SiO2/4H-SiC interface states reduction by POCl3 post-oxidation annealing
Pascu, Razvan; Craciunoiu, Florea; Kusko, Mihaela; Mihaila, Mihai; Pristavu, Gheorghe; Badila, Marian; Brezeanu, Gheorghe
- 作者Pascu, Razvan; Craciunoiu, Florea; Kusko, Mihaela; Mihaila, Mihai; Pristavu, Gheorghe; Badila, Marian; Brezeanu, Gheorghe
- 文件大小530.49KB
- 发表时间2015
- DOI10.1109/smicnd.2015.7355225
- 页码255-258