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Gate-Tunable Ultrahigh Photoresponsivity of 2D Heterostructures Based on Few Layer MoS
<sub/>2</sub>
and Solution-Processed rGO

Gate-Tunable Ultrahigh Photoresponsivity of 2D Heterostructures Based on Few Layer MoS ₂ and Solution-Processed rGO

Yang, Juehan; Huo, Nengjie; Li, Yan; Jiang, Xiang-Wei; Li, Tao; Li, Renxiong; Lu, Fangyuan; Fan, Chao; Li, Bo; Nørgaard, Kasper; Laursen, Bo W.; Wei, Zhongming; Li, Jingbo; Li, Shu-Shen

期刊名称Advanced Electronic Materials
作者Yang, Juehan; Huo, Nengjie; Li, Yan; Jiang, Xiang-Wei; Li, Tao; Li, Renxiong; Lu, Fangyuan; Fan, Chao; Li, Bo; Nørgaard, Kasper; Laursen, Bo W.; Wei, Zhongming; Li, Jingbo; Li, Shu-Shen
卷第1卷
期第10期
印刷ISSN2199-160X
文件大小1556.69KB
发表时间2015-10
DOI10.1002/aelm.201500267

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